Abstract：The paper analyzes Extreme ultraviolet (EUV)lithography patents newly filed from 2019 and 2023.Through citation network analysis,it identifies technical communities with high modularity and relative stability.Combining IPC-based technology convergence networks with econometric models,it quantifies the contribution of community-level network centrality indicators to the EUV field.The study systematically maps the core technologies,process flows,and key devices and components in the EUV domain,providing empirical support for research on technological systems theory.The findings show that technological convergence relies on cross-disciplinary,cross-industry,and multi-actor collaboration.Technological differentiation and a decentralized global supply chain constitute the fundamental basis of innovation,while structural holes reflect the deepening of technological division of labor and the increasing complexity of demand.This research offers a scientific basis for China's technological tracking and breakthroughs in the EUV lithography field,and proposes constructive strategies to narrow the technology gap.
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