Breaking the Technology Lock-in Through“Technology Transition”in Carbon-Based Chips
Chen Pei1,2, Xuan Zhaohui2, Li Xinrong3, Yang Wu4
1. School of Business Administration,Ningbo University of Finance and Economics,Ningbo 315175,China; 2. Chinese Academy of Science and Technology for Development,Beijing 100038,China; 3. Business School,University of International Business and Economics,Beijing 100029,China; 4. School of Economics and Management,University of Science and Technology Beijing,Beijing 100083,China
Abstract:Technology Transition (TT)is not only an important means to alleviate the risk of technology supply disruption and ensure the controllable security of the supply chain,but also an inevitable choice to break through the technology lock-in imposed by developed countries.Extreme Ultraviolet (EUV)lithography and carbon-based electronic technology are two key high-end chip technology fields.This paper compares and analyzes the technology lock-in effects in these two fields from the dimensions of technical characteristics and innovation entities,and proposes the theoretical mechanism and strategies for breaking through the lock-in of carbon-based chips through TT.The research finds that,compared with carbon-based electronics,from the perspective of technical paths,EUV lithography has a serious lock-in effect.From the perspective of innovation entities,the technological lock-in intensity gap between China and leading countries in EUV lithography is large,verifying the feasibility of TT for carbon-based electronics.This study provides new reference strategies for the selection of technological entry points and the breaking of technology lock-in for latecomers.
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