Abstract：High-value patents,as key carriers of regional innovation assets,have increasingly become critical signals for attracting the high-quality foreign R&D centers to locate in the region.Using panel data from 208 Chinese cities over the period 2001-2023,this study empirically finds that the accumulation of regional high-value patents significantly promotes the entry of foreign R&D centers,and this finding remains robust.Mechanism analysis indicates that high-value patents enhance the attractiveness to foreign R&D centers through two pathways:improving the marketization of data elements and promoting the integration of the digital and real economies.The intensity of talent introduction and the level of artificial intelligence play positive moderating roles in this process.Heterogeneity analysis shows that the attraction effect is more pronounced in regions with stronger emphasis on innovation,well-developed digital infrastructure,and sound industrial structure upgrading.This paper reveals the intrinsic logic by which high-value patents transform innovation assets into global appeal,and provides empirical evidence for optimizing the cultivation mechanism of high-value patents and enhancing the attractiveness of high-quality foreign investment.
夏芸, 涂静岚, 黄霆耀. 高价值专利对外资研发中心区位选择的影响研究[J]. 中国科技论坛, 2026(9): 123-130.
Xia Yun, Tu Jinglan, Huang Tingyao. The Impact of High-Value Patents on the Location Choice of Foreign R&D Centers. , 2026(9): 123-130.
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