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| Research on the Dynamic Mechanism of Chip Lithography Technology Innovation |
| Zhang Beibei1, Li Cunjin2, Yin Ximing2,3 |
1. Institutes of Science and Development,Chinese Academy of Science,Beijing 100190,China;
2. School of Management and Economics,Beijing Institute of Technology,Beijing 100081,China;
3. Research Center for Integrated Development,Beijing Institute of Technology,Beijing 100081,China |
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Abstract Chip lithography technology innovation is a complex system engineering.Mastering the principle of scientific innovation is an essential basis for breaking through the “bottleneck”problem.Based on the complex system management theory,the micro-dynamic process mechanism of chip lithography technology innovation is constructed,and the mechanism is empirically tested through social network and cluster analysis from the dimensions of patent data.It is found that the complex system management theory is internally consistent with the chip lithography technology innovation and can reveal the internal complex integrity law between elements in the process of major complex technology innovation. “Element update iteration-combination relationship optimization-system structure reengineering”is an effective advanced dynamic innovation path to realize the function transition of chip lithography technology from iteration to transition.The research conclusion expands the theoretical management basis of major complex technology innovation represented by chip lithography technology from the micro level and provides academic and policy enlightenment for winning the key core technology “bottleneck”problem and accelerating the realization of high-level S&T self-reliance and self-improvement.
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Received: 19 January 2022
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2022, Vol. 3 
