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中国科技论坛  2022, Issue (9): 73-84    
  产业研究 本期目录 | 过刊浏览 | 高级检索 |
光刻机产业技术扩散与技术动态演化——对“卡脖子”技术的启示
杨武, 陈培, Gad David
北京科技大学经济管理学院,北京 100083
The Study of Technology Diffusion and Technology Dynamic Evolution in Lithography Industry——Implications for Neck-Jamming Technologies
Yang Wu, Chen Pei, Gad David
School of Economics and Management,University of Science and Technology Beijing,Beijing 100083,China
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摘要 在当前中美贸易摩擦升级、“卡脖子”技术频繁出现的背景下,研究光刻技术扩散与动态演化对攻克“卡脖子”技术、突破全局具有重要意义。本文利用专利引证数据构建引文网络,并通过局部向前搜索、局部向后搜索和关键路径3种不同的主路径分析方法来描述光刻技术知识扩散路径,进行对比分析,并对光刻技术动态演化的阶段进行了识别与分析。研究结果表明:美、日、德先发优势明显,光刻技术的扩散由台积电、阿斯麦等大公司主导;技术发展前期,主要侧重器件制造和工艺的改进,而在后期则注重光刻材料的研发,从2015年开始技术扩散方向主要集中在EUV光刻胶材料;与全球范围内光刻技术扩散趋势相比,我国进入光刻领域较晚,技术扩散能力不强且尚未出现在技术扩散主路径中。本研究从技术扩散路径和技术动态演化两个角度揭示了光刻技术扩散的客观规律和特征,丰富了“卡脖子”技术的理论研究,为我国技术路径选择提供企业和技术层面的决策支持与经验依据,以期对突破发达国家的核心技术锁定带来一定的启示。
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杨武
陈培
Gad David
关键词 光刻机产业“卡脖子”技术技术扩散技术演化    
Abstract:In the current escalating trade tensions between China and the United States and the frequent emergence of“Neck-jamming”technologies,studying the diffusion and dynamic evolution of lithography technology is crucial to overcome the“Neck-jamming”technology issue and breakthrough the whole situation.This paper uses patent citation to construct a citation network and describe the lithography technology diffusion path using three main path analysis methods named as local forward search,local backward search,and key-route path.A comparative analysis identifies and analyzes the stages of the dynamic evolution of lithography technology.The results show that:the United States (US),Japan (JP),and German (GE) have first-mover advantages,and the diffusion of lithography technology is dominated by large companies such as TSMC and ASML.At the beginning of the technology development,the focus was on manufacturing devices and improving processes.While in the later phase,the focus was on developing lithographic materials.From 2015 onward,technology diffusion mainly focuses on EUV photoresist materials.Compared to the global trend of lithography technology diffusion,China entered the field of lithography late,and its technology diffusion capability is not strong and has not yet appeared on the leading technology path.This study reveals lithography technology diffusion's rules and characteristics from two perspectives:the technology diffusion path and the technology dynamic evolution.It enriches the theoretical research on“neck-jamming”technology.Also,it provides decision support and an empirical basis for selecting technological path.
Key wordsLithography industry    Neck-jamming technology    Technology diffusion    Technology dynamic evolution
收稿日期: 2021-10-22     
PACS:  G306  
  F062.4  
基金资助:国家自然科学基金面上项目“我国专利密集型产业破解国外技术锁定的机理、路径与对策研究”(72074019)。
通讯作者: 陈培   
作者简介: 杨武(1961-),男,山东临沂人,教授、博士生导师,研究方向为技术创新。
引用本文:   
杨武, 陈培, Gad David. 光刻机产业技术扩散与技术动态演化——对“卡脖子”技术的启示[J]. 中国科技论坛, 2022(9): 73-84.
Yang Wu, Chen Pei, Gad David. The Study of Technology Diffusion and Technology Dynamic Evolution in Lithography Industry——Implications for Neck-Jamming Technologies. , 2022(9): 73-84.
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