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| Research on Coupling Measurement of Technology Innovation System in Patent Intensive Industry |
| Yang Dafei1,2, Yang Wu3, Su Yi4,5, Zhang Xiaohong1,2 |
1. School of Economics and Management,Beijing Institute of Petrochemical Technology,Beijing 102617,China;
2. Enterprise Development Research Center,Beijing Institute of Petrochemical Technology,Beijing 102617,China;
3. Donlinks School of Economics and Management,University of Science and Technology Beijing,Beijing 100083,China;
4. School of Economics and Management,Harbin Engineering University,Harbin 150001,China;
5. School of Economics and Management,Tsinghua University,Beijing 100084,China |
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Abstract From the perspective of system theory,technology innovation system of patent intensive industry can be divided into five subsystems of technology innovation environment,technology research and development,technology acquisition and renovation,technology output and auxiliary,and this paper studies the coupling relationship of technology innovation system,and constructs an evaluation index system and a coupling degree measurement model.It does an empirical research based on the panel data of China's patent intensive industries from 2012 to 2016.The results shows that the coupling degrees of technology innovation coordination of patent intensive industries are low and declining year by year,because the coupling degrees of subsystems among the same industry are low and significant.The cooperation degree of communication equipment manufacturing industry is the highest and stable,while that of radar and supporting equipment manufacturing industry is the lowest,and decreasing year by year.The distribution of coordination coupling degree of the technology innovation system is presented as an "olive".The numbers of industries in low and high coupling areas are small,while that in medium coupling areas is large,and the number of industries in the highly coupled sector remains relatively stable.Finally,according to results,targeted improvement measures are proposed.
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Received: 18 December 2019
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2020, Vol. 1 
